The metallized film will be tightly wound around a cylinder, after which the films will be processed by heat treatment to expel air from the winding as uniformly as possible. In MFCs, a dielectric polymer film with several ^m thickness is typically used as the storage medium, and a very thin (several nm) metal film is deposited on the polymer film as the electrode. Improving the performance and lifetime of MFCs has been of great interest and is studied by many researchers. Therefore the lifetime of the capacitor is greatly extended.
Hence, the capacitor can continue to operate without interruption and with just a small amount of capacitance loss. However, by using MFCs, the arc discharge extinguishes without causing large damage except for the destruction of a small area of the metal layer around the defect.
Such a breakdown will destroy the device for traditional film capacitors. A dielectric film inevitably bears defects or impurities, forming a 'weak power point' or 'discharge point' in all kinds of capacitors. They have the significant advantage of self-healing and clearing a defect in a dielectric, which is the spontaneous extinction of a local electrical breakdown due to some defects. Metallized film capacitors (MFCs) have been used as energy storage systems with high energy density since the 1950s in pulsed power techniques. ©2014 IOP Publishing Ltd and Deutsche Physikalische Gesellschaft Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal Keywords: micro plasma, metallized film capacitors, particle in cellĬontent from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. At still higher applied voltage (~100V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.
At low applied voltage (~15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (~50 V). Indeed, the high electric field due to the small gap sustains the discharge by field emission. The discharge process is significantly different from a conventional high pressure discharge. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 ^m gap in a range of different voltages and pressures. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In metallized film capacitors, there exists an air gap of about 0.2 ^m between the films, with a pressure ranging generally from 1-30 atm. Wei Jiang12, Ya Zhang13 and Annemie Bogaerts3ġ School of Physics, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of ChinaĢĜentre for Mathematical Plasma-Astrophysics, Department of Mathematics, Katholieke Universiteit Leuven, B-3001 Leuven, Belgiumģ Research group PLASMANT, Department of Chemistry University of Antwerp, B-2610 Wilrijk-Antwerp, BelgiumĮ-mail: 5 June 2014, revised 24 September 2014 Accepted for publication 1 October 2014 Published 14 November 2014 The open access journal at the forefront of physicsĭeutsche PhysikalischeGeseUschaft DPG IOP Institute Of PhySjCS This content was downloaded on at 07:34 Please note that terms and conditions apply. View the table of contents for this issue, or go to the journal homepage for moreĭownload details: IP Address: 203.64.11.45 This content has been downloaded from IOPscience. Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors Home Search Collections Journals About Contact us My IOPscience
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